Electron
Beam Lithography
- Feature Sizes Down to 20 nm
- Multilayer Device Fabrication
- Ultra-Fine Features Over Large Area
(up to 8” wafers)
(Click Image to Enlarge)
Near Field Scanning Optical
Microscope
- Feature Sizes Down to 100 nm
- 1 mm x 1mm Continuous Write w/o Stitch
and Repeat
- Layer to Layer Alignment w/o Fiducial
Marks
(Click Image to Enlarge)
Photolithography (Contact Mask
Aligner)
- Feature Sizes Down to 2 microns
- Up to 3” Wafers
(Click Image to Enlarge)
Class 1,000 Clean Room
- Resist Spinner
- Plasma Ashing Station
(Click Image to Enlarge)
Ion Mill Station |
